MoO3 thin films prepared via MOCVD from a volatile molybdenyl complex

Abstract

A volatile molybdenyl complex of formula MoO₂(dpm)₂ has been studied as a precursor for MOCVD of MoO₃ films. Qualitative indications on the possible decomposition path were obtained by mass spectrometry and thermal analysis. Good quality films were deposited using Pt and Si(100) as substrates. The films were characterised by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), IR and UV–VIS spectroscopies.