Quantitative depth profile analysis by glow discharge optical emission spectrometry: an alternative approach

Abstract

A new approach to quantitative depth profile analysis by glow discharge optical emission spectrometry is presented, based on the approximation of matrix-independent emission yields. In this approach, the sputtering rate corrected calibration is calculated directly from the raw calibration data using a multi-element calibration algorithm. This makes it possible to use for calibration bulk reference samples only those matrices that are to be analysed, without the need to determine their sputtering rates beforehand. Much less a priori information is needed in comparison with other existing quantification schemes; any glow discharge source anode diameter and any glow discharge operating conditions can be used. The accuracy of the sample composition determination approaches that of the single-matrix (‘bulk mode’) analysis.