Atomic Spectrometry Update—Industrial Analysis: Metals, Chemicals and Advanced Materials

Abstract

This Atomic Spectrometry Update is the latest in an annual series appearing under the title of ‘Industrial Analysis’. The structure of the review is broadly the same as in previous years.

The range of techniques which can now be used routinely in an industrial laboratory has probably never been wider. In some respects, the selection of the most appropriate technique to address a given problem is becoming harder with every passing year. In the field of plasma spectroscopy, there have been significant developments in the design of laser, spark and glow discharge sampling cells which are clearly beginning to make an impact on the wider field concerned with the direct analysis of solids. The explosion of interest in the use of chromatography in all its various forms, for preconcentration, extraction, separation and speciation in conjunction with both AAS and AES (using ICP and MIP sources) continues unabated, with the sensitivity and selectivity of ICP-MS being used to particular advantage. High resolution ICP-MS promises still further advances in analytical performance in this area. Equally, progress made in the XRF arena with preconcentation technology, and total reflection geometries has demonstrated that the technique may be applied to good effect in the analysis of liquids, and in non-destructive depth profiling applications, once considered the domain of surface analysis techniques. It may not be possible for every laboratory to have all the techniques available, but it would appear that many existing techniques are being developed to the stage where each is able to address a wider range of applications.