Simulation of the vaporization process in inductively coupled plasma atomic emission spectrometry with a modified model using the Monte Carlo technique

Abstract

An improved Monte Carlo program based on the velocity model and two-temperature model for the simulation of the aerosol vaporization process in an inductively coupled plasma (ICP) is presented. The influence of carrier gas flow rate, Q_g, on the useful mass transport rate, W_u, and the influence of Q_g on W_u at a given observation height above the load coil are studied. The variation of the evaporated and unevaporated droplet numbers with Q_g at a known observation height in the axial channel of the ICP is also presented. The results confirm experimental observations that carrier gas flow rate and observation height are the critical parameters in controlling W_u and hence, in large part, the observed emission signal. As expected, the quality of the aerosol input is also shown to be an important factor.