Optically and chemically amplified photoresists based on poly(hydroxyaminoester)s
Abstract
Processes for both optical and autocatalytic chemical amplification of a latent image have been realized in the polymer donor poly(hydroxyaminoester) in the presence of the electron acceptor hexabromodimethylsulfone and the chemical sensitizes dimethylaminobenzaldehyde. This resulted in a negative photoresist with a sensitivity as high as 0.2–0.5 mJ cm–2.