Determination of trace impurities in pure copper by isotope dilution inductively coupled plasma mass spectrometry

Abstract

An analytical method has been developed to determine trace impurities in pure Cu. The Cu matrix is separated from trace impurities by controlled potential electrodeposition. More than 99% of the Cu matrix can be removed with better than 90% efficiency of trace element recovery. Isotope dilution calibration is employed with the spike isotopes being added prior to electrodeposition. Analytical results for National Institute of Standards and Technology Standard Reference Materials (394 Unalloyed Copper I and 395 Unalloyed Copper II) are presented together with determination limits, recovery efficiency and optimized potential.