Issue 5, 1991

Electrodeposition and study of multilayered Co/Cu structures

Abstract

A new procedure for electrodeposition of Co/Cu multilayers by pulse deposition from a single solution is reported. From studies of structure and magnetic properties it has been shown that this method can produce multilayered structures with layer thicknesses as low as 10–15 Å or less and the perpendicular orientation of the magnetization vector promises a possible use in storage devices with vertical recording.

Article information

Article type
Paper

J. Mater. Chem., 1991,1, 795-797

Electrodeposition and study of multilayered Co/Cu structures

V. M. Fedosyuk, O. I. Kasyutich and N. N. Kozich, J. Mater. Chem., 1991, 1, 795 DOI: 10.1039/JM9910100795

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements