Faraday communications. EXAFS evidence for the formation of a V2O5 thin film by chemical vapour deposition on SiO2
Abstract
V K-edge EXAFS studies of V2O5/SiO2 catalysts prepared by a chemical vapour deposition (CVD) method demonstrate the formation of V2O5 thin films, while the V2O5 of V2O5/SiO2 prepared by an impregnation method is mainly in the form of microcrystallites.