High-pressure synthesis, structure and novel photochemical reactions of 7,7,8,8-tetramethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene

Abstract

7,7,8,8-Tetramethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene 1, prepared by the high-pressure reaction (10 000 bar) of 1,1,2,2-tetramethyl-1,2-disilacyclohexa-3,5-diene and phenyl vinyl sulphoxide followed by elimination of benzenesulphenic acid, gave tetramethyldisilene (Me₂SiSiMe₂) upon photolysis which underwent a photochemical [2 + 4] reaction with benzene at 10 K in an argon matrix to regenerate the precursor.