A silica monolayer on alumina was formed by chemical vapour deposition of silicon methoxide; almost all the silanol attached to the alumina did not form Brønsted acid site.
M. Niwa, T. Hibino, H. Murata, N. Katada and Y. Murakami, J. Chem. Soc., Chem. Commun., 1989, 289 DOI: 10.1039/C39890000289
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