Determination of impurities in titanium carbide and titanium nitride by inductively coupled plasma atomic emission spectrometry

Abstract

Inductively coupled plasma atomic emission spectrometry was applied to the determination of impurities (Al, Ca, Co, Cr, Fe, Mg, Mn, Mo, Na, Nb, Ni, Si, V, W and Zr) in titanium carbide (TiC) and titanium nitride (TiN). A 0.5-g amount of the powder sample was decomposed with 7.5 ml of nitric acid and 2.5 ml of hydrofluoric acid in a PTFE jar. The matrix effects on the background levels and the emission intensities of the elements were compensated for by using matrix-matched standard solutions for calibration. The results showed that the proposed method was useful for the analysis of TiC and TiN samples.