Effects of dopants on tin emission in a helium microwave-induced plasma

Abstract

Tin is prone to form refractory oxides in a microwave-induced plasma environmet in the presence of oxygen. In order to minimise the formation and deposition processes, various dopants were evaluated. From these, sulphur hexafluoride (SF₆) gave the best results. It minimised tin oxide deposition thus leading to a better sensitivity for tin. Analytical performances for the determination of organotin compounds are also given.