CO Adsorption suppression due to charge transfer in the Ni–SiOx–n-Si(111) system at low Ni coverage
Abstract
No CO adsorption was observed in the He I u.v. photoelectron spectra at low Ni coverage on SiOx–n-Si(111) where charge transfer has been concluded to occur, whereas normal CO adsorption was observed at low Ni coverage on SiOx–p-Si(111) or at high Ni coverage on SiOx–n-Si(111); these results show that charge transfer occurring in a narrow region at low Ni coverage is responsible for the suppression of CO adsorption.
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