Combined reagent purification and sample dissolution (CORPAD) applied to the trace analysis of silicon, silica and quartz
Abstract
A simple and reliable method is described for the determination of impurities in very high-purity single-crystal silicon and in siliceous materials of importance to the electronics industry. Reagent purification and sample dissolution take place simultaneously within a closed PTFE vessel; the analyses are completed by carbon furnace atomic-absorption spectrometry. The very low reagent blank levels enable aluminium, chromium, copper and iron to be determined at levels as low as 5 ng gā1.