Issue 5, 1981

Chemical vapour deposition of TiO2 film using an organometallic process and its photoelectrochemical behaviour

Abstract

Vapour pyrolysis of ethyl titanate has been performed in order to obtain thin TiO2 films. A selective deposition of rutile films is found to occur when substrate temperatures are below 500°C and the gas phase has a large linear velocity. The physical properties of the as-grown films, including their photoelectrochemical behaviour, are examined in relation to their condition of deposition. A thick rutile film grown on a Ti plate converts light energy to electricity with good quantum efficiency in a photoelectrochemical cell.

Article information

Article type
Paper

J. Chem. Soc., Faraday Trans. 1, 1981,77, 1051-1057

Chemical vapour deposition of TiO2 film using an organometallic process and its photoelectrochemical behaviour

Y. Takahashi, K. Tsuda, K. Sugiyama, H. Minoura, D. Makino and M. Tsuiki, J. Chem. Soc., Faraday Trans. 1, 1981, 77, 1051 DOI: 10.1039/F19817701051

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements