Reactions of methylsilane at the surfaces of nickel, rhodium and tungsten
Abstract
The chemisorption and reactions of methylsilane at the surfaces of films of nickel, rhodium and tungsten at 195 K and above have been investigated to determine how the metal-catalysed reactions of silanes differ from those of alkanes. Methylsilane chemisorption is accompanied by the formation of gas-phase hydrogen and methane and isotopic studies have shown that adsorption occurs through the silicon atom. Mutual exchange between CH3SiH3 and CH3SiD3 is catalysed by all three metals at 195 K. Exchange is confined to the silyl group and some poisoning occurs. Exchange between CH3SiH3 and D2 is catalysed by the metals investigated but substantial poisoning of the reaction is observed. Surfaces poisoned by this reaction retain activity for mutual exchange. Mechanisms of exchange are proposed.