Issue 8, 1976

Photo-oxidation of nitroso-compounds: dissociative mechanism for the photo-oxidation of 2-methyl-2-nitrosobutane

Abstract

The photo-oxidation of 2-methyl-2-nitrosopropane in the gas phase is shown to proceed by a dissociative mechanism via peroxyl and alkoxyl radicals and to provide a model system for the study of the oxidation of low levels of NO to NO2, which is of interest in studies of reactions occurring in photochemical smog.

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1976, 297-298

Photo-oxidation of nitroso-compounds: dissociative mechanism for the photo-oxidation of 2-methyl-2-nitrosobutane

J. Pfab, J. Chem. Soc., Chem. Commun., 1976, 297 DOI: 10.1039/C39760000297

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