Issue 21, 1975

Nitroxide chemistry. Part IX. Reaction of NN-bistrifluoromethyl-amino-oxyl with tetramethylsilane, chloromethylsilanes, and methoxymethylsilanes

Abstract

Reaction of the oxyl (CF3)2N·O· with the silanes MenSiCl4–n(n= 1–4) involves formation of silyl esters R3Si·CO2·N(CF3)2via the disubstitution compounds R3Si·CH[O·N(CF3)2]2. Under the conditions employed the silyl esters are unstable and decompose either by a radical mechanism to give carbon dioxide and bistrifluoromethyl-amino and silyl (R3Si·; R3= Me3 or Me2Cl) radicals or by an intramolecular elimination of carbon monoxide to afford the hydroxylamine R3Si·O·N(CF3)2(R3= MeCl2 or Cl3) which competes with the radical mechanism. The silanes (MeO)nSiMe4–n(n= 3 and 4) react to give the substitution products (CF3)2N·O·CH2·O·SiMe(OMe)2 and (CF3)2N·O·CH2·O·Si(OMe)3, respectively. Further oxyl attack on the latter product gives exclusively the silane [(CF3)2N·O·CH2·O]2Si(OMe)2.

Article information

Article type
Paper

J. Chem. Soc., Dalton Trans., 1975, 2225-2229

Nitroxide chemistry. Part IX. Reaction of NN-bistrifluoromethyl-amino-oxyl with tetramethylsilane, chloromethylsilanes, and methoxymethylsilanes

R. N. Haszeldine, D. J. Rogers and A. E. Tipping, J. Chem. Soc., Dalton Trans., 1975, 2225 DOI: 10.1039/DT9750002225

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