Issue 9, 1972

Studies in vacuum ultraviolet photochemistry. Part I. 2,2,3,3-Tetramethylbutane

Abstract

2,2,3,3-Tetramethylbutane has been photolysed at 123·6 and 147 nm at substrate pressures of 1–25 Torr, and conversions of 0·03–0·3%. The primary processes are both molecular and free-radical in nature. The use of the free-radical scavengers oxygen, nitric oxide, and hydrogen sulphide show the existence of four important primary processes (1)–(4). At 147 nm, a further primary process producing molecular methane also occurs. The Me3C·CMe3* C4H8+ C4H10(1), C6H14+ 2Me·(2), C3H6+ Me·+ Bu (3), C4H8+ H + Bu (4), photolysis mechanism involves extensive free-radical participation, and in this respect behaves in a manner similar to that of neopentane.

Article information

Article type
Paper

J. Chem. Soc., Perkin Trans. 2, 1972, 1150-1153

Studies in vacuum ultraviolet photochemistry. Part I. 2,2,3,3-Tetramethylbutane

B. G. Gowenlock and C. A. F. Johnson, J. Chem. Soc., Perkin Trans. 2, 1972, 1150 DOI: 10.1039/P29720001150

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