Issue 0, 1971

Molecular structure of bis(trifluoromethyl)nitroxyl: an electron diffraction study

Abstract

The molecular structure of bis-(trifluoromethyl)nitroxyl, (CF3)2NO, has been determined in the vapour phase by the sector microphotometer electron diffraction method. Principal structural parameters with estimated standard deviations in parentheses are: r(NO) 1·26(3), r(CN) 1·441(8), and r(CF) 1·320(4)Å; F–C–F 109·8°(1·0°), C–N–C 120·9°(2·0°), C–N–O 117·2°(0·6°). The angle between the CNC plane and the NO bond is 22°(3°).

Article information

Article type
Paper

J. Chem. Soc. A, 1971, 478-481

Molecular structure of bis(trifluoromethyl)nitroxyl: an electron diffraction study

C. Glidewell, D. W. H. Rankin, A. G. Robiette, G. M. Sheldrick and S. M. Williamson, J. Chem. Soc. A, 1971, 478 DOI: 10.1039/J19710000478

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