Issue 20, 1970

Reactions of recoiling silicon atoms with phosphine, silane, and disilane

Abstract

A high ratio of radioactive trisilane to disilane obtained from the reactions of silicon atoms in phosphine–disilane mixtures is evidence for insertion by :31SiH2 as the product-determining step.

Article information

Article type
Paper

J. Chem. Soc. D, 1970, 1331-1332

Reactions of recoiling silicon atoms with phosphine, silane, and disilane

P. P. Gaspar and P. Markusch, J. Chem. Soc. D, 1970, 1331 DOI: 10.1039/C29700001331

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