Photodeposition from tetra ethyl lead
Abstract
The adsorption of tetra ethyl lead on the surface of the quartz crystal of an electronic microbalance and the deposition rate on the crystal as a function of light intensity and pressure during the photolysis of tetra ethyl lead (TEL) were measured. Although the deposition rate was controlled by a gas-phase reaction, a secondary surface reaction controlled the delineation of the deposit. Oxygen reduced the amount of TEL adsorbed and increased the photodeposition rate by a secondary surface process. Carbon was detected in the photodeposit from pure TEL but a photodeposit obtained in oxygen did not contain either carbon or oxygen.