Issue 17, 2019

Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas

Abstract

Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.

Graphical abstract: Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas

Supplementary files

Article information

Article type
Paper
Submitted
21 Dec 2018
Accepted
07 Mar 2019
First published
26 Mar 2019
This article is Open Access
Creative Commons BY license

RSC Adv., 2019,9, 9517-9521

Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas

K. Wang, M. Wang, H. Lu, B. Liu, M. Huang and J. Yang, RSC Adv., 2019, 9, 9517 DOI: 10.1039/C8RA10486G

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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