Issue 45, 2021
From the journal:

Dalton Transactions

Correction: Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions

Ghada El Jamal,a   Thomas Gouder,b   Rachel Eloirdi,b   Evgenia Tereshina-Chitrova,cd   Lukáš Horákd  and  Mats Jonsson*a  

* Corresponding authors

a School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Department of Chemistry, Applied Physical Chemistry, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden
E-mail: matsj@kth.se

b European Commission, Joint Research Centre, Postfach 2340, DE-76215 Karlsruhe, Germany

c Institute of Physics, ASCR, Prague, Czech Republic

d Faculty of Mathematics and Physics, Charles University, 12116 Prague, Czech Republic

Abstract

Correction for ‘Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions’ by Ghada El Jamal et al., Dalton Trans., 2021, DOI: 10.1039/d1dt01020d.

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Article information

DOI
https://doi.org/10.1039/D1DT90137K
Article type
Correction
Submitted
04 Aug 2021
Accepted
04 Aug 2021
First published
12 Nov 2021
This article is Open Access
Creative Commons BY license

Dalton Trans., 2021,50, 16849-16849

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Correction: Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions

G. El Jamal, T. Gouder, R. Eloirdi, E. Tereshina-Chitrova, L. Horák and M. Jonsson, Dalton Trans., 2021, 50, 16849 DOI: 10.1039/D1DT90137K

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