Issue 22, 2014
From the journal:

Nanoscale

Correction: Atomic layer deposition of a MoS2 film

Lee Kheng Tan,ab   Bo Liu,c   Jing Hua Teng,b   Shifeng Guo,b   Hong Yee Lowd  and  Kian Ping Loh*a  

* Corresponding authors

a Department of Chemistry and Graphene Research Centre, National University of Singapore, 3 Science Drive 3, Singapore 117543
E-mail: chmlohkp@nus.edu.sg

b A*STAR Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602

c Department of Physics and Graphene Research Centre, National University of Singapore, 2 Science Drive 3, Singapore 117551

d Singapore University of Technology and Design, 20 Dover Dr, Singapore 138682

Abstract

Correction for ‘Atomic layer deposition of a MoS2 film’ by Lee Kheng Tan et al., Nanoscale, 2014, 6, 10584–10588.

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Article information

DOI
https://doi.org/10.1039/C4NR90076F
Article type
Correction
First published
07 Oct 2014
This article is Open Access
Creative Commons BY license

Nanoscale, 2014,6, 14002-14002

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Correction: Atomic layer deposition of a MoS2 film

L. K. Tan, B. Liu, J. H. Teng, S. Guo, H. Y. Low and K. P. Loh, Nanoscale, 2014, 6, 14002 DOI: 10.1039/C4NR90076F

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