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Insight into the mechanism of different substituents on the zinc-oxo cluster in solubility switching

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Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance via intramolecular interactions

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Halogenated Metal‐Organic Clusters for High‐Resolution Extreme Ultraviolet Lithography Resists†

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Structural investigation of zinc‐based photoresists with different substituents for high‐resolution lithography

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Pathways to high-performance extreme ultra-violet lithography resists: Dissociative electron attachment to pentafluoro-phenyl triflate

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Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography

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Harnessing Zn-volatility for compositional tuning in PtZn nanoalloy catalysts

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Mechanism of Vapor-Phase Infiltration of Organometallic Hf in Poly(Methyl Methacrylate) for Hybrid Resist Applications

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Zn-Ti oxo cluster photoresists for EUV Lithography: Cluster structure and lithographic performance

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Absorption‐coefficient calculation of short‐wavelength photoresist materials: From EUV to BEUV and water window X‐ray

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Smart Molecules, 2025, 3
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DFT Study on CO2- and H2O-Enhanced Solubility Contrast in Tin-Oxo Cage Photoresists

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Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography

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Additive-Assisted Forming High-Quality Thin Films of Sn–Oxo Cluster for Nanopatterning

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Metal-Core-Specific Screening with Machine Learning: Accelerating the Discovery of Metal Oxide Clusters for Enhanced EUV Lithography Resolution

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Multipurpose organic–inorganic hybrid dielectrics with photothermal crosslinking of zirconium-oxo clusters

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Advanced lithography materials: From fundamentals to applications

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Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution

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Adv Funct Materials, 2025, 35
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Photothermally Synergistic Cross‐Linking in Three‐Component Smart Materials for Precise and Tough Micro and Nanopatterning

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Adv Funct Materials, 2026, 36
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A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography

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Multibenzyl Chloride Based Molecular Resists Enabling 13 nm Half-Pitch Lithography via Self-Cross-Linking

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Hydrogen self-supplying initiators excited by visible light for the fabrication of transparent films

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One‐Reactor Upcycling of Waste Polyesters into Functional MOFs for Passive Radiative Cooling

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ChemSusChem, 2026, 19
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Polymerizable Nonionic Perfluorinated Photoacid Generators for High‐Resolution Lithography

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Small Methods, 2024, 8
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Regulation and Synthesis of Mixed‐Ligand Titanium–Oxide Nanoparticles for 12 nm Nanolithography

Shicui Xing, Dong Wang, Zhipeng Fan, Wenbing Kang, Qianqian Wang and Xu Wang

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Transmission Electron Microscopy Unraveled Ionic Oxygen-Affinity Engineering of Metal Oxo Clusters with Extreme Ultraviolet Lithography Activity

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ACS Nano, 2026
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Synthesis and Structure of New Trinuclear Zinc(II) Complexes with Hexanoic or 3-Vinylbenzoic Acid Anions and 1,10-Phenanthroline

N. V. Gogoleva, A. A. Chirkova, M. A. Shmelev and I. L. Eremenko

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Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

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Radiation chemistry of a novel zinc–oxo cluster crosslinking strategy for EUV patterning

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Optimizing Charge Balance in Quantum Dot Light-Emitting Diodes through Benzoic Acid-Passivated ZnO Nanoparticle Layers

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Cu/Zn phthalocyanine dyes with up to 40% solubility in propylene glycol monomethyl ether acetate (PGMEA) for color filters

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Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography

Yake Wang, Jinping Chen, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Yanqing Wu, Shumin Yang, Jun Zhao, Guoqiang Yang and Yi Li

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Theoretical Investigation on Lithographic Properties of Zinc–Oxo and Cadmium–Oxo Clusters Ligated with Differently Substituted Benzoic Acids

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Langmuir, 2026
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Enhancing performance of Ti-Zn-oxo clusters for advanced lithography: effect of vertical ionization potential on sensitivity

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Nano metal-oxygen cluster EUV photoresists and their performance influencing factors

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Sci. Sin.-Chim, 2024, 54, 2452
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Spatiotemporal Studies of Soluble Inorganic Nanostructures with X‐rays and Neutrons

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Angewandte Chemie, 2024, 136
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Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography

Gayoung Kim, Yejin Ku, Subin Jeon, Jin‐Kyun Lee, Seohyeon Lee, Byung Jun Jung, Sung‐Il Lee, Choonghan Ryu, Kangho Park, Yun Lim Jung, Changyoung Jeong and Jin Choi

Adv Funct Materials, 2025, 35
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光刻技术与光刻胶材料的进展与未来趋势

许路奎 Xu Lukui, 范子雄 Fan Zixiong, 王璐玮 Wang Luwei, 郭勇 Guo Yong, 朱殷铷 Zhu Yinru, 高欣慰 Gao Xinwei, 严伟 Yan Wei and 屈军乐 Qu Junle

Chin. J. Laser, 2025, 52, 0700001
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Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator‐Bound Polymer Resists

Yue Liu, Dong Wang, Haihua Wang, Huan Chen, Qianqian Wang and Wenbing Kang

Small, 2025, 21
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Impact of chemical stochastics in extreme ultraviolet photoresists on the pattern quality

Jianing Li and Haoyuan Li

AIP Advances, 2025, 15
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Trinuclear Tin Complexes for Advanced Lithography: Sensitivity Enhancement via the Synergistic Effect in Dual Cross-Linking Systems

Xiaofeng Gong, Zijian Chen, Daohan Wang, Runfeng Xu, Xinyan Huang, Lingfeng Zheng, Min Zhang, Wenzheng Li, Jun Zhao, Pengzhong Chen, Jianjun Du, Jiangli Fan and Xiaojun Peng

Inorg. Chem., 2025, 64, 11931
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