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Sub-200-nm-diameter cylindrical silicon nanopillars with high aspect ratio (40:1) fabricated by SF6/C4F8-modulated ICP-RIE
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Surface engineering of standing hollow circular cylinder ordered arrays (HCCA) and used as platform for excellent SERS substrate
Zhibing Tang, Sujuan Feng, Luping Meng, Xing Wang, Jingru Zhang, Cuixia Bi, Hongyan Zhao and Guangqiang Liu
Applied Surface Science, 2022, 594, 153425
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Femtosecond laser fabrication of nanopillar arrays for Surface-Enhanced Raman scattering substrates
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Optics & Laser Technology, 2025, 181, 111659
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Screening of spherical moulds manufactured isotropically in plasma etching conditions
Etienne Herth, Djaffar Belharet, Samson Edmond, David Bouville, Laurent Robert and Franck Lardet‐Vieudrun
Contributions to Plasma Physics, 2021, 61
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High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
Zhitian Shi, Konstantins Jefimovs, Marco Stampanoni and Lucia Romano
Materials Science in Semiconductor Processing, 2023, 157, 107311
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Surface Engineering of Standing Hollow Circular Cylinder Ordered Arrays (Hcca) and Used as Platform for Excellent Sers Substrate
Zhibing tang, Sujuan feng, Luping meng, Xing wang, jingru zhang, Cuixia Bi, Hongyan zhao and guangqiang liu
SSRN Journal, 2022
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