Issue 2, 2017

Junction behavior of n-Si photoanodes protected by thin Ni elucidated from dual working electrode photoelectrochemistry

Abstract

Si is a desirable photoanode material for use in photoelectrochemical water-splitting devices. However, Si self-passivates during the oxygen evolution half reaction and requires a protection layer to maintain high photoanodic efficiency. Thin evaporated metallic Ni layers have been reported to protect Si while also enhancing the kinetics for oxygen evolution. Maximizing performance of these and related protected/catalyzed semiconductors requires a fundamental understanding of the semiconductor|catalyst|solution interface. We use dual-working-electrode (DWE) photoelectrochemistry measurements to directly measure the interface's electronic properties in situ during operation. By controlling the Ni thickness (3, 5, and 20 nm), we confirm that favorable shifts in photocurrent onset are correlated with thinner protection layers. Photoelectrochemical DWE measurements are used to test various prevailing hypotheses for the origin of this behavior. We find evidence that increased photovoltage is due to the development of a spatially inhomogeneous buried junction wherein high barrier regions arise via adventitious SiO2 growth. Thinner protection layers more readily promote this behavior by facilitating solution permeation to the n-Si|Ni interface. Repeated electrochemical cycling of thicker catalyst layers can achieve similar behavior and improve the photocurrent onset by as much as 300 mV. The results are discussed in the context of the general design principles for metal–insulator–semiconductor protected photoanodes.

Graphical abstract: Junction behavior of n-Si photoanodes protected by thin Ni elucidated from dual working electrode photoelectrochemistry

Supplementary files

Article information

Article type
Paper
Submitted
01 Ker. 2016
Accepted
16 Gen. 2017
First published
16 Gen. 2017

Energy Environ. Sci., 2017,10, 570-579

Junction behavior of n-Si photoanodes protected by thin Ni elucidated from dual working electrode photoelectrochemistry

F. A. L. Laskowski, M. R. Nellist, R. Venkatkarthick and S. W. Boettcher, Energy Environ. Sci., 2017, 10, 570 DOI: 10.1039/C6EE03505A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements