Issue 39, 2013
From the journal:

Chemical Communications

Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend†‡

Giovanna De Luca,ab   Andrea Liscio,c   Glauco Battagliarin,d   Long Chen,d   Luigi Monsù Scolaro,e   Klaus Müllen,d   Paolo Samorì*f  and  Vincenzo Palermo*c  

* Corresponding authors

a Dipartimento di Scienze del Farmaco e Prodotti per la Salute, Università di Messina, V.le Annunziata, 98168 Messina, Italy

b Istituto per i Materiali Compositi e Biomedici, Consiglio Nazionale delle Ricerche, P.le Tecchio 80, 80125 Napoli, Italy

c Istituto per la Sintesi Organica e la Fotoreattività, Consiglio Nazionale delle Ricerche, via Gobetti 101, 40129 Bologna, Italy
E-mail: vincenzo.palermo@isof.cnr.it

d Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany

e Dipartimento di Scienze Chimiche, and C.I.R.C.M.S.B., Università di Messina, V.le Stagno d'Alcontres 31, 98166 Vill. S. Agata, Messina, Italy

f ISIS & icFRC, Université de Strasbourg & CNRS, 8 allée Gaspard Monge, 67000 Strasbourg, France
E-mail: samori@unistra.fr

Abstract

Selective solvent vapour annealing is used on a photovoltaic blend to enhance the interaction between the electron acceptor and the electron donor, simplifying thin films post-processing for photovoltaic applications. A remarkable improvement in the interfacial charge transfer in the bulk hetero-junction is attained, as measured by Kelvin Probe Force Microscopy.

Graphical abstract: Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend

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Article information

DOI
https://doi.org/10.1039/C2CC37909K
Article type
Communication
Submitted
31 Here 2012
Accepted
27 Ker. 2012
First published
03 Gen. 2013

Chem. Commun., 2013,49, 4322-4324

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Orthogonal self-assembly and selective solvent vapour annealing: simplified processing of a photovoltaic blend

G. De Luca, A. Liscio, G. Battagliarin, L. Chen, L. M. Scolaro, K. Müllen, P. Samorì and V. Palermo, Chem. Commun., 2013, 49, 4322 DOI: 10.1039/C2CC37909K

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