A novel stable zinc–oxo cluster for advanced lithography patterning

Youming Si, Yingdong Zhao, Guangyue Shi, Danhong Zhou, Feng Luo, Pengzhong Chen, Jiangli Fan and Xiaojun Peng

J. Mater. Chem. A, 2023, 11, 4801
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A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography

Zhihao Wang, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang and Yi Li

RSC Appl. Interfaces, 2024, 1, 544
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Iodonium functionalized polystyrene as non-chemically amplified resists for electron beam and extreme ultraviolet lithography

Xindi Yao, Peng Lian, Jinping Chen, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang and Yi Li

RSC Appl. Polym., 2024, 2, 870
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Increasing the sensitivity of a non-chemically amplified molecular resist by cascade esterification

Huining Wang, Jinping Chen, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Guoqiang Yang and Yi Li

RSC Appl. Interfaces, 2025, 2, 1008
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Configurable swellability of hydrogel microstructure for structural-color-based imaging concealment/encryption

Yunhui Wu, Lanlan Liu, Guohao Bo, Qiang Li, Chenjie Dai, Zhongyang Li, Jian Zhang and Xuefeng Zhang

Nanoscale, 2024, 16, 4289
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Lithographic performances of aryl sulfonate ester-modified polystyrenes as nonchemically amplified resists

Rongrong Peng, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Shuangqing Wang, Xudong Guo, Rui Hu, Jun Zhao, Yanqing Wu, Guoqiang Yang and Yi Li

Ind. Chem. Mater., 2025, 3, 553
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Nonchemically Amplified Molecular Resists Based on Sulfonium-Functionalized Sulfone Derivatives for Sub-13 nm Nanolithography

Yake Wang, Jinping Chen, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Yanqing Wu, Shumin Yang, Jun Zhao, Guoqiang Yang and Yi Li

ACS Appl. Nano Mater., 2023, 6, 18480
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Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes

Li Miao, Ruisheng Zhang, Xinyu Lu, Lianbin Wu, Zaoxia Wen, Huayu Qiu and Guang-Peng Wu

ACS Appl. Mater. Interfaces, 2024, 16, 51554
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Preparation of Fine Patterns without Residual Layers by Photonanoimprinting Using PDMS Molds

Takashi Yanagishita, Teppei Nariyama, Toshiaki Kondo and Hideki Masuda

ACS Appl. Eng. Mater., 2025, 3, 3515
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A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography

Yake Wang, Jundi Yuan, Jinping Chen, Yi Zeng, Tianjun Yu, Xudong Guo, Shuangqing Wang, Guoqiang Yang and Yi Li

ACS Omega, 2023, 8, 12173
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Theoretical Investigation on Lithographic Properties of Zinc–Oxo and Cadmium–Oxo Clusters Ligated with Differently Substituted Benzoic Acids

Yiming Lin, Guobo Chen, Chengyao Zhao, Pengfei Wu, Xinyu Shen, Shuwei Xia and Liangmin Yu

Langmuir, 2026
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Enhancing Performance of Cross-Linking Negative-Tone Chemically Amplified Photoresists by Controlling Interfacial Interactions via Molecular Hydrophilicity Adjustment

Siliang Zhang, Xuewen Cui, Xue Cong, Yurui Wu, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li and Guoqiang Yang

Chem. Mater., 2025, 37, 1914
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Polymerizable Nonionic Perfluorinated Photoacid Generators for High‐Resolution Lithography

Yue Liu, Dong Wang, Qianqian Wang and Wenbing Kang

Small Methods, 2024, 8
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Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced Lithography

Yake Wang, Jinping Chen, Yi Zeng, Tianjun Yu, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci, Jun Zhao, Shumin Yang, Yanqing Wu, Guoqiang Yang and Yi Li

ACS Omega, 2022, 7, 29266
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Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography

Xue Cong, Siliang Zhang, Jiaxing Gao, Xuewen Cui, Yurui Wu, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li and Guoqiang Yang

ACS Omega, 2024, 9, 37585
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Molecular simulation-based developer screening for molecular glass photoresists

Peng Lian, Rongrong Peng, Tianjun Yu, Guoqiang Yang, Jinping Chen, Yi Li and Yi Zeng

Computational Materials Science, 2025, 246, 113429
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Multiparameter Method for Developer Screening of Molecular Glass Resists via Molecular Simulations

Peng Lian, Zhuoran Liu, Rui Hu, Guoqiang Yang, Tianjun Yu, Jinping Chen, Yi Li and Yi Zeng

ACS Appl. Mater. Interfaces, 2024, 16, 57636
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Molecular nonchemically amplified resists based on spirobixanthene backbone: Sulfoxime oxime esters versus sulfonium salts

Yu Yan, Chenfei Zhao, Jingwen Hui, Xinfu Zhang, Xue Zhang, Pengzhong Chen, Xiaojun Peng and Yi Xiao

Smart Molecules, 2026, 4
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Quantum metamaterials: Applications in quantum information science

Solomon Uriri, Yaseera Ismail and Mhlambululi Mafu

APL Quantum, 2025, 2
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Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography

Yang Qiao, Guangyue Shi, Ou Zhang, You Li, Michaela Vockenhuber, Yasin Ekinci, Feng Luo and Lei Zhang

Sci. China Mater., 2024, 67, 3132
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Synchronous Multifunctional Combinatorial Chemistry on a Molecular Glass Backbone─a Strategy for Developing Photoresists with Improved Lithography Performances

Yu Yan, Chenfei Zhao, Jingwen Hui, Xinfu Zhang, Xue Zhang, Yifeng Peng, Pengzhong Chen, Xiaojun Peng and Yi Xiao

Chem. Mater., 2026, 38, 1927
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Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Jiaxing Gao, Siliang Zhang, Xuewen Cui, Xue Cong, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li and Guoqiang Yang

Adv Materials Inter, 2023, 10
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Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography

Zhuoran Liu, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Michaela Vockenhuber, Peng Tian, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang and Yi Li

ACS Appl. Electron. Mater., 2025, 7, 2640
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Increasing the Sensitivity of Nonchemically Amplified Resists by Oxime Sulfonate-Functionalized Polystyrene

Huiwen An, Jinping Chen, Yi Zeng, Tianjun Yu, Shuangqing Wang, Xudong Guo, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Guoqiang Yang and Yi Li

ACS Appl. Polym. Mater., 2024, 6, 5374
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Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography

Zhihao Wang, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Timothée Allenet, Michaela Vockenhuber, Yasin Ekinci, Guoqiang Yang and Yi Li

ACS Appl. Mater. Interfaces, 2023, 15, 2289
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Spirobixanthene surpasses spirobifluorene as key backbone for molecular negative photoresists

Yu Yan, Chenfei Zhao, Jingwen Hui, Xinfu Zhang, Linlin Zhao, Lujia Yang, Zhipeng Ning, Pengzhong Chen, Lingcheng Chen, Xiaojun Peng and Yi Xiao

Chinese Chemical Letters, 2026, 37, 111343
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Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution

Yingdong Zhao, Riyao Cong, Zijian Chen, Jun Zhao, Pengzhong Chen and Xiaojun Peng

Adv Funct Materials, 2025, 35
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Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography

Xiaodong Yuan, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Peng Tian, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Jun Zhao, Yanqing Wu, Guoqiang Yang and Yi Li

J. Micro/Nanopattern. Mats. Metro., 2024, 23
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Photoresists based on bisphenol A derivatives with tert-butyl ester groups for electron beam lithography

Shengwen Hu, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Guoqiang Yang and Yi Li

Journal of Photochemistry and Photobiology A: Chemistry, 2023, 436, 114351
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Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application

Santu Nandi, Lalit Khillare, Sunil Kumar, Mohamad G. Moinuddin, Manvendra Chauhan, Sumit Choudhary, Satinder K. Sharma, Subrata Ghosh and Kenneth E. Gonsalves

ACS Appl. Nano Mater., 2023, 6, 4132
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High-Resolution Nanotransfer Printing of Porous Crossbar Array Using Patterned Metal Molds by Extreme-Pressure Imprint Lithography

Tae Wan Park, Young Lim Kang, Yu Na Kim and Woon Ik Park

Nanomaterials, 2023, 13, 2335
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Adamantane-containing drug delivery systems

Stela Dragomanova and Velichka Andonova

PHAR, 2023, 70, 1057
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Advanced lithography materials: From fundamentals to applications

Yanhui Zhang, Haojie Yu, Li Wang, Xudong Wu, Jiawen He, Wenbing Huang, Chengaung Ouyang, Dingning Chen and Basem E. Keshta

Advances in Colloid and Interface Science, 2024, 329, 103197
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Synergistic Enhancement Effects of Heterogeneous Isomorphism Clusters in Response to Irradiation: Sub-10 nm Nanolithography and Nanoscale Etching Transfer

Yang Qiao, Changliang Li, Fengbo Yan, Zhaochao Liu, Xingkun Wang, Jianan Xie, Guangyue Shi, Jian Wei, Jun Zhao, Lei Zhang and Feng Luo

Nano Lett., 2025, 25, 7732
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Formation of Multiscale Pattern Structures by Combined Patterning of Nanotransfer Printing and Laser Micromachining

Tae Wan Park, Young Lim Kang, Eun Bin Kang, Seungmin Kim, Yu Na Kim and Woon Ik Park

Nanomaterials, 2023, 13, 2327
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