Issue 4, 2018

Insertion of sulfur dioxide via a radical process: an efficient route to sulfonyl compounds

Abstract

This review is focused on the recent advances in the chemistry of sulfur dioxide fixation through a radical process. Diverse sulfonyl compounds can be obtained efficiently under mild conditions. In general, aryl radicals, vinyl radicals, alkyl radicals, and nitrogen-centered radicals can react with sulfur dioxide, giving rise to sulfonyl radical intermediates. The resulting sulfonyl radicals can be captured by nucleophiles, olefins, and alkynes. The sources of aryl radicals from aryldiazonium salts, aryl halides, and diaryliodonium salts are demonstrated. It is believed that more amazing SO2-based achievements will be developed in the near future.

Graphical abstract: Insertion of sulfur dioxide via a radical process: an efficient route to sulfonyl compounds

Article information

Article type
Review Article
Submitted
30 নভে. 2017
Accepted
08 ডিসে. 2017
First published
12 ডিসে. 2017

Org. Chem. Front., 2018,5, 691-705

Insertion of sulfur dioxide via a radical process: an efficient route to sulfonyl compounds

G. Qiu, K. Zhou, L. Gao and J. Wu, Org. Chem. Front., 2018, 5, 691 DOI: 10.1039/C7QO01073G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements