Three-dimensional electroactive ZnO nanomesh directly derived from hierarchically self-assembled block copolymer thin films

Ashwanth Subramanian, Gregory Doerk, Kim Kisslinger, Daniel H. Yi, Robert B. Grubbs and Chang-Yong Nam

Nanoscale, 2019, 11, 9533
DOI: 10.1039/C9NR00206E

Perpendicular orientation of microdomains in PS-b-PMMA thin films on the PS brushed substrates

Rui Guo, Eunhye Kim, Jinsam Gong, Seunghoon Choi, Sujin Ham and Du Yeol Ryu

Soft Matter, 2011, 7, 6920
DOI: 10.1039/c1sm05562c

Evolution of block-copolymer order through a moving thermal zone

Kevin G. Yager, Nathaniel J. Fredin, Xiaohua Zhang, Brian C. Berry, Alamgir Karim and Ronald L. Jones

Soft Matter, 2010, 6, 92
DOI: 10.1039/B916200C

Reordering transitions during annealing of block copolymer cylinder phases

Pawel W. Majewski and Kevin G. Yager

Soft Matter, 2016, 12, 281
DOI: 10.1039/C5SM02441B

Beyond native block copolymer morphologies

Gregory S. Doerk and Kevin G. Yager

Mol. Syst. Des. Eng., 2017, 2, 518
DOI: 10.1039/C7ME00069C

Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography

Katharina Brassat, Daniel Kool, Julius Bürger and Jörg K. N. Lindner

Nanoscale, 2018, 10, 10005
DOI: 10.1039/C8NR01397G

Ordering in thin films of block copolymers: Fundamentals to potential applications

I.W. Hamley

Progress in Polymer Science, 2009, 34, 1161
DOI: 10.1016/j.progpolymsci.2009.06.003

Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers

Javier Arias‐Zapata, Sophie Böhme, Jérôme Garnier, Cécile Girardot, Antoine Legrain and Marc Zelsmann

Adv Funct Materials, 2016, 26, 5690
DOI: 10.1002/adfm.201601469

Ion Beam Patterning of Block Copolymer Thin Films

Ranulfo Allen, John Baglin, Oun-Ho Park and Ho-Cheol Kim

J. Photopol. Sci. Technol., 2009, 22, 755
DOI: 10.2494/photopolymer.22.755

Defect-Free Perpendicular Diblock Copolymer Films: The Synergy Effect of Surface Topography and Chemistry

Xingkun Man, Pan Zhou, Jiuzhou Tang, Dadong Yan and David Andelman

Macromolecules, 2016, 49, 8241
DOI: 10.1021/acs.macromol.6b01814

Bending of Lamellar Microdomains of Block Copolymers on Nonselective Surfaces

Sang-Min Park, Meng Dong, Charles T. Rettner, David S. Dandy, Qiang Wang and Ho-Cheol Kim

Macromolecules, 2010, 43, 1665
DOI: 10.1021/ma9020196

Guiding Block Copolymers into Sequenced Patterns via Inverted Terrace Formation

Sungjune Park, Larisa Tsarkova, Stephanie Hiltl, Stefan Roitsch, Joachim Mayer and Alexander Böker

Macromolecules, 2012, 45, 2494
DOI: 10.1021/ma202616w

Non-native three-dimensional block copolymer morphologies

Atikur Rahman, Pawel W. Majewski, Gregory Doerk, Charles T. Black and Kevin G. Yager

Nat Commun, 2016, 7
DOI: 10.1038/ncomms13988

Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

Javier Arias-Zapata, Djawhar Ferrah, Hasan-al Mehedi, Gilles Cunge and Marc Zelsmann

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018, 36
DOI: 10.1116/1.5035333

Enhanced Hybridization and Nanopatterning via Heated Liquid-Phase Infiltration into Self-Assembled Block Copolymer Thin Films

Ashwanth Subramanian, Nikhil Tiwale, Gregory Doerk, Kim Kisslinger and Chang-Yong Nam

ACS Appl. Mater. Interfaces, 2020, 12, 1444
DOI: 10.1021/acsami.9b16148

Rapid ordering of block copolymer thin films

Pawel W Majewski and Kevin G Yager

J. Phys.: Condens. Matter, 2016, 28, 403002
DOI: 10.1088/0953-8984/28/40/403002

Wrinkle‐Directed Self‐Assembly of Block Copolymers for Aligning of Nanowire Arrays

Bong Hoon Kim, Yemuk Choi, Ju Young Kim, Hyunjae Shin, Sungyong Kim, Seung‐Woo Son, Sang Ouk Kim and Pilnam Kim

Advanced Materials, 2014, 26, 4665
DOI: 10.1002/adma.201400804

Progression of Alignment in Thin Films of Cylinder-Forming Block Copolymers upon Shearing

Raleigh L. Davis, Brian T. Michal, Paul M. Chaikin and Richard A. Register

Macromolecules, 2015, 48, 5339
DOI: 10.1021/acs.macromol.5b01028

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

Jaewon Choi, June Huh, Kenneth R. Carter and Thomas P. Russell

ACS Nano, 2016, 10, 7915
DOI: 10.1021/acsnano.6b03857

Nanoscale Block Copolymer Self‐Assembly and Microscale Polymer Film Dewetting: Progress in Understanding the Role of Interfacial Energies in the Formation of Hierarchical Nanostructures

Katharina Brassat and Jörg K. N. Lindner

Adv Materials Inter, 2020, 7
DOI: 10.1002/admi.201901565

In‐plane and out‐of‐plane defectivity in thin films of lamellar block copolymers

Nikhila Mahadevapuram, Indranil Mitra, Alona Bozhchenko, Joseph Strzalka and Gila E. Stein

J Polym Sci B Polym Phys, 2016, 54, 339
DOI: 10.1002/polb.23937

Self-assembled monolayer-modified block copolymers for chemical surface nanopatterning

N.A. Yufa, S.L. Fronk, S.J. Rosenthal, Seth B. Darling, W.A. Lopes and S.J. Sibener

Materials Chemistry and Physics, 2011, 125, 382
DOI: 10.1016/j.matchemphys.2010.10.052

Morphology Tailoring of Thin Film Block Copolymers on Patterned Substrates

Xianggui Ye, Brian J. Edwards and Bamin Khomami

Macromol. Rapid Commun., 2012, 33, 392
DOI: 10.1002/marc.201100744

Controlling Order in Block Copolymer Thin Films for Nanopatterning Applications

Andrew P. Marencic and Richard A. Register

Annu. Rev. Chem. Biomol. Eng., 2010, 1, 277
DOI: 10.1146/annurev-chembioeng-073009-101007

High Aspect Ratio Sub‐15 nm Silicon Trenches From Block Copolymer Templates

Xiaodan Gu, Zuwei Liu, Ilja Gunkel, S. T. Chourou, Sung Woo Hong, Deirdre L. Olynick and Thomas P. Russell

Advanced Materials, 2012, 24, 5688
DOI: 10.1002/adma.201202361

Ordering of lamellar block copolymers on oxidized silane coatings

Nikhila Mahadevapuram, Indranil Mitra, Shyam Sridhar, Joseph Strzalka and Gila E. Stein

European Polymer Journal, 2016, 75, 495
DOI: 10.1016/j.eurpolymj.2016.01.010

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

Dong Hyup Kim, Ahram Suh, Geonhyeong Park, Dong Ki Yoon and So Youn Kim

ACS Appl. Mater. Interfaces, 2021, 13, 5772
DOI: 10.1021/acsami.0c19665

Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

Ho-Cheol Kim, Sang-Min Park and William D. Hinsberg

Chem. Rev., 2010, 110, 146
DOI: 10.1021/cr900159v

Block Copolymer Response to Photothermal Stress Fields

Pawel W. Majewski and Kevin G. Yager

Macromolecules, 2015, 48, 4591
DOI: 10.1021/acs.macromol.5b00955

Modification of block copolymer lithography masks by O2/Ar plasma treatment: insights from lift-off experiments, nanopore etching and free membranes

Katharina Brassat, Daniel Kool and Jörg K N Lindner

Nanotechnology, 2019, 30, 225302
DOI: 10.1088/1361-6528/ab06dd

Lamellar Diblock Copolymers on Rough Substrates: Self-Consistent Field Theory Studies

Xingkun Man, Jiuzhou Tang, Pan Zhou, Dadong Yan and David Andelman

Macromolecules, 2015, 48, 7689
DOI: 10.1021/acs.macromol.5b01362

Self-Assembly of AB Diblock Copolymers under Confinement into Topographically Patterned Surfaces

Guang Yang, Ping Tang, Yuliang Yang and Joao T. Cabral

J. Phys. Chem. B, 2009, 113, 14052
DOI: 10.1021/jp9033613

Dewetting-Induced Alignment and Ordering of Cylindrical Mesophases in Thin Block Copolymer Films

Heng Zhang, Binghua Wang, Gang Wang, Changyu Shen, Jingbo Chen, Günter Reiter and Bin Zhang

Macromolecules, 2020, 53, 9631
DOI: 10.1021/acs.macromol.0c01233

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

Austin P. Lane, XiaoMin Yang, Michael J. Maher, Gregory Blachut, Yusuke Asano, Yasunobu Someya, Akhila Mallavarapu, Stephen M. Sirard, Christopher J. Ellison and C. Grant Willson

ACS Nano, 2017, 11, 7656
DOI: 10.1021/acsnano.7b02698

Multilayer block copolymer meshes by orthogonal self-assembly

Amir Tavakkoli K. G., Samuel M. Nicaise, Karim R. Gadelrab, Alfredo Alexander-Katz, Caroline A. Ross and Karl K. Berggren

Nat Commun, 2016, 7
DOI: 10.1038/ncomms10518

Understanding Film Thickness‐Dependent Block Copolymer Self‐Assembly by Controlled Polymer Dewetting on Prepatterned Surfaces

Katharina Brassat, Daniel Kool, Colin G. A. Nallet and Jörg K. N. Lindner

Adv Materials Inter, 2020, 7
DOI: 10.1002/admi.201901605

Metallic Nanomeshes Fabricated by Multimechanism Directed Self-Assembly

Runze Liu, Hejin Huang, Zehao Sun, Alfredo Alexander-Katz and Caroline A. Ross

ACS Nano, 2021, 15, 16266
DOI: 10.1021/acsnano.1c05315