Issue 9, 2024

Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

Abstract

The International Roadmap for Devices and Systems (IRDS) predicts the integration of 2D materials into high-volume manufacturing as channel materials within the next decade, primarily in ultra-scaled and low-power devices. While their widespread adoption in advanced chip manufacturing is evolving, the need for diverse characterization methods is clear. This is necessary to assess structural, electrical, compositional, and mechanical properties to control and optimize 2D materials in mass-produced devices. Although the lab-to-fab transition remains nascent and a universal metrology solution is yet to emerge, rapid community progress underscores the potential for significant advancements. This paper reviews current measurement capabilities, identifies gaps in essential metrology for CMOS-compatible 2D materials, and explores fundamental measurement science limitations when applying these techniques in high-volume semiconductor manufacturing.

Graphical abstract: Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

Article information

Article type
Review Article
Submitted
26 dek 2023
Accepted
30 mar 2024
First published
08 apr 2024
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2024,6, 2260-2269

Metrology for 2D materials: a perspective review from the international roadmap for devices and systems

U. Celano, D. Schmidt, C. Beitia, G. Orji, A. V. Davydov and Y. Obeng, Nanoscale Adv., 2024, 6, 2260 DOI: 10.1039/D3NA01148H

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