Electrodeposition of Reactive Polymer Networks for Conformal Ultrathin Coatings Amenable to Post-Deposition Functionalization

Abstract

Functional thin coatings are crucial in modern and emerging technologies, providing specified surface properties and protection, thereby influencing the performance and lifetime of materials and devices. The electrodeposition of polymer networks (EPoN) has recently been reported as a facile and potentially broadly applicable method to fabricate conformal polymeric ultrathin films on conductive substrates with arbitrary shapes and surface topography under mild solution conditions. In this work, a new generation of EPoN is introduced that utilizes a chemically reactive polymer appended by a small fraction of a electrochemical crosslinker as side groups. This EPoN iteration eliminates the need for precise end-group functionalization, enables the tuning of crosslink density and film thickness independent of polymer size, and the resulting reactive ultrathin films are amenable to post-deposition modification with desired functionalities using facile click-chemistry. To demonstrate this concept, we electrodeposit polyisoprene with small side-group fractions of the oxidative crosslinker phenol (<5%) as a thiol-ene-reactive polymer network coating. The EPoN-derived ultrathin films are tunable and uniform with a thickness in the 100s of nanometers depending on phenol fraction and electrodeposition potential, and show a conformal morphology on complex porous electrode architectures. We further demonstrate post-EPoN functionalization of the ultrathin polyisoprene coatings with thiol-ene chemistry.

Supplementary files

Article information

Article type
Paper
Submitted
12 May 2025
Accepted
31 Jul 2025
First published
01 Aug 2025
This article is Open Access
Creative Commons BY-NC license

J. Mater. Chem. A, 2025, Accepted Manuscript

Electrodeposition of Reactive Polymer Networks for Conformal Ultrathin Coatings Amenable to Post-Deposition Functionalization

J. Yan, J. G. Werner, W. Wang, Y. Li, A. B. Resing and Z. Zheng, J. Mater. Chem. A, 2025, Accepted Manuscript , DOI: 10.1039/D5TA03811A

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements