Enhanced stretchability and stability of micro-hole-mesh electrodes via a crack-guiding notch design

Abstract

The rapid development of flexible devices demands greater stretchability and stability in conductive metal electrodes, which are indispensable components in a wide range of flexible technologies. In this work, we propose and show a novel hole-mesh structure featuring a directional crack-guiding notch (CGN) design, which can help to disperse stretching stress/strain, while effectively confining cracks to pre-notched locations, minimizing harm to the structural continuity and electrical conductivity of the electrode film. As a proof of concept, hole-mesh thin films (Pt/Au) with the CGN design were fabricated and transferred directly onto an elastic polymer substrate (polydimethylsiloxane, PDMS) and tested under repetitive stretching conditions. It was found that the hole-mesh electrodes, with the CGN design, exhibit significantly enhanced stretchability and excellent stability of conductivity, withstanding up to 20% strain for 170 cycles—a remarkable improvement compared to the reference samples without notches, which typically fail at lower strains. Subsequent finite element simulations further reveal that the crack-guiding notches effectively suppress uncontrolled crack propagation through the hole-mesh electrode, releasing accumulated strain only at the predefined notched locations in a well-controlled manner, and thus maintain the overall conductivity of the hole-mesh electrodes. This very convenient but effective CGN design holds great promise for broad applications in stretchable electronics, sensors, and displays.

Graphical abstract: Enhanced stretchability and stability of micro-hole-mesh electrodes via a crack-guiding notch design

Supplementary files

Article information

Article type
Paper
Submitted
15 Jul 2025
Accepted
01 Oct 2025
First published
02 Oct 2025

Nanoscale, 2025, Advance Article

Enhanced stretchability and stability of micro-hole-mesh electrodes via a crack-guiding notch design

W. Qian, L. Weng, J. Wang and L. Yu, Nanoscale, 2025, Advance Article , DOI: 10.1039/D5NR02993G

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