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Abstract | Cited by

To realize the full benefit of directed self-assembly (DSA), it is necessary to understand the interplay between the target structures and the process parameters. In this paper, we cover the reasons as to why a compact model and model-based synthesis are required for graphoepitaxial DSA of cylinder forming block copolymers.

Graphical abstract: Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing

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