Floquet Engineering of Topological Phase Transitions in Intrinsic Ferrovalley Semiconductor via Circularly and Elliptically Polarized Light

Abstract

Floquet engineering provides a non-contact approach to dynamically tailor electronic band structures and induce topological phase transitions via time-periodic optical fields. However, experimental limitations such as dissipation and the underexplored role of anisotropic driving have hindered its application in two-dimensional magnetic semiconductors. Recently, monolayer 2H RuCl2 has been identified as a promising ferrovalley material exhibiting large out-of-plane magnetic anisotropy and tunable first-and second-order topological phases. In this work, we construct a Wannier-based tight-binding model and apply Floquet-Bloch theory to monolayer 2H RuCl2 under circularly, elliptically, and linearly polarized light. We examine both off-resonant and on-resonant driving schemes by considering different scales of light frequency. In the off-resonant scheme, we demonstrate that both the amplitude and ellipticity of light can trigger band inversion at the K' valley, leading to a topological phase transition into a quantum anomalous Hall (QAH) phase with a quantized Hall conductance and Chern number C = 1. In the on-resonant scheme, the hybridization of Floquet replica bands reveals even richer topological phase transitions driven by light frequency, amplitude, and ellipticity. Notably, we observe a Floquet-induced QAH phase with high Chern number C = 3, suggesting that intrinsic ferrovalley semiconductors such as RuCl2 serve as an ideal platform for Floquet band engineering in future topological quantum devices.

Supplementary files

Article information

Article type
Paper
Submitted
09 Sep 2025
Accepted
05 Nov 2025
First published
05 Nov 2025

J. Mater. Chem. C, 2025, Accepted Manuscript

Floquet Engineering of Topological Phase Transitions in Intrinsic Ferrovalley Semiconductor via Circularly and Elliptically Polarized Light

W. Wang, X. Zhang, Y. Tian, H. Bai, S. Li, W. Gong and X. Kong, J. Mater. Chem. C, 2025, Accepted Manuscript , DOI: 10.1039/D5TC03354C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements