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Issue 26, 2013
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The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

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Abstract

Film thickness and functional group retention are routinely measured parameters for plasma polymers. It is known that other parameters such as density, solubility and mechanical properties can affect the performance of the plasma polymer film, however such parameters are not often measured; nor is there any understanding of the link between the mechanisms of film growth and these properties. In this investigation we produced thin films from three classes of commonly used plasma polymers (hydrocarbons, glymes and carboxylic acids). By choosing the monomer structure and applied RF power, the dominant mechanism of film growth was varied between ionic deposition and neutral grafting. The density, solubility and modulus of the resulting films were then measured by atomic force microscopy. Films grown from saturated monomers had higher moduli, were less soluble, and surprisingly had lower density compared to their unsaturated analogues. The results demonstrate that cognizance of the mechanism of film growth allows the physical properties of the film to be tailored for specific applications.

Graphical abstract: The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

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Publication details

The article was received on 16 Apr 2013, accepted on 23 May 2013 and first published on 23 May 2013


Article type: Paper
DOI: 10.1039/C3SM51039E
Citation: Soft Matter, 2013,9, 6167-6175

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    The link between mechanisms of deposition and the physico-chemical properties of plasma polymer films

    A. Michelmore, D. A. Steele, D. E. Robinson, J. D. Whittle and R. D. Short, Soft Matter, 2013, 9, 6167
    DOI: 10.1039/C3SM51039E

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