Chemical Modelling
Applications and Theory
Volume 10
A Specialist Periodical Report
Chemical Modelling-Applications and Theory
Volume 10
A Review of Recent Literature
Editors
J-O Joswig, Technische Universität, Dresden, Germany
M. Springborg, University of Saarland, Saarbrücken, Germany
Authors
Heitor Avelino de Abreu, Universidade Federal de Minas Gerais, Belo Horizonte-MG, Brazil
Victor S. Batista, Yale University, Connecticut, USA
Jason Bedford, Yale University, Connecticut, USA
Hélio Anderson Duarte, Universidade Federal de Minas Gerais, Belo - Horizonte-MG, Brazil
Guilherme Ferreira de Lima, Universidade Federal de Minas Gerais, - Belo Horizonte-MG, Brazil
Diego A. Ho, Universidade Federal de Santa Catarina, Brazil
Andreas Köhn, Johannes Gutenberg-Universitat Mainz, Germany
Mathias Rapacioli, Université Paul Sabatier, Toulouse, France
Luis G. C. Rego, Universidade Federal de Santa Catarina, Brazil
Rex T. Skodje, University of Colorado, Boulder, USA
Ingolf Warnke, Yale University, Connecticut, USA
Dequan Xiao, Yale University, Connecticut, USA
Sergei N. Yurchenko, University College London, London, UK
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ISBN: 978-1-84973-586-5
ISSN: 0584-8555
DOI: 10.1039/9781849737241
A catalogue record for this book is available from the British Library
© The Royal Society of Chemistry 2014
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