Issue 36, 2024

A solution-processable benzothiazole-substituted formazanate zinc(ii) complex designed for a robust resistive memory device

Abstract

A novel mononuclear bis(formazanate)zinc complex (1) based on a redox-active 1-(benzothiazol-2-yl)-5-(2-benzoyl-4-chlorophenyl)-3-phenyl formazan ligand has been synthesized and characterized. Complex 1 was prepared by reacting one equivalent of Zn(OCOCH3)·2H2O with two equivalents of the corresponding formazan derivative. X-ray crystallography was employed to ascertain the solid-state structure of compound 1, and the analysis revealed a distorted octahedral geometry for the complex where the symmetrical ligands exhibit a preference for coordinating with the zinc center in the ‘open’ form, generating five-membered chelate rings. Moreover, cyclic voltammetry analysis reveals that complex 1 exhibits the capacity for electrochemical reduction as well as oxidation, resulting in the formation of radical anionic (L2Zn) and dianionic (L2Zn2−) states as well as the oxidation state of 1. Additionally, the developed solution-processable complex 1 was employed as the fundamental building material for resistive switching memory applications. The [FTO/ZnIIL2(1)]/Ag RRAM device demonstrates exceptional resistive memory switching properties, with a substantial ION/IOFF ratio (103), low operational VSET and VRESET (0.9 V and −0.75 V) voltages, excellent endurance stability (100 cycles), and decent retention time (more than 2000 seconds). The findings presented in this study underscore the importance of redox-active formazanate metal complexes for creating promising memory storage devices.

Graphical abstract: A solution-processable benzothiazole-substituted formazanate zinc(ii) complex designed for a robust resistive memory device

Supplementary files

Article information

Article type
Paper
Submitted
05 Jun 2024
Accepted
21 Aug 2024
First published
22 Aug 2024

Dalton Trans., 2024,53, 15338-15349

A solution-processable benzothiazole-substituted formazanate zinc(II) complex designed for a robust resistive memory device

S. Birara, S. Saini, M. Majumder, S. P. Tiwari and R. K. Metre, Dalton Trans., 2024, 53, 15338 DOI: 10.1039/D4DT01640H

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