Issue 5, 2023

Enhancing UV photodetection performance of an individual ZnO microwire p–n homojunction via interfacial engineering

Abstract

As a typical broad bandgap semiconductor, ZnO has received considerable attention for developing optoelectronic devices in ultraviolet wavelengths, but suffers from a lack of high-quality single-crystalline p-type ZnO. Herein, we report the realization of a homojunction ultraviolet photodetector, which involves a p-type Sb-doped ZnO microwire (ZnO:Sb MW) and n-type ZnO layer. The p-type conductivity of the as-synthesized ZnO:Sb MWs was evidenced using an individual wire field-effect transistor. Due to its good rectifying ability and excellent photovoltaic effect, the constructed p-ZnO:Sb MW/n-ZnO homojunction is able to work as an ultraviolet photodetector in self-biased and reversely biased manners. By appropriately engineering the band alignment of the p-ZnO:Sb/n-ZnO homojunction via a MgO interface modification layer, the optimized photodetector exhibits performance-enhanced ultraviolet detection capabilities, such as the light on/off ratio reaching up to 1.6 × 108, responsivity of over 267 mA W−1 and specific detectivity of approximately 1.2 × 1014 Jones upon 365 nm light illumination at 0 V. The detector also produces faster response with rise/recovery times of 102 μs/3.6 ms. This study not only employed a novel method to synthesize genuine p-type ZnO with excellent stability and reproducibility, but also opened up substantial opportunities for developing high-performance ZnO homojunction optoelectronic devices.

Graphical abstract: Enhancing UV photodetection performance of an individual ZnO microwire p–n homojunction via interfacial engineering

Supplementary files

Article information

Article type
Paper
Submitted
17 Nov 2022
Accepted
23 Dec 2022
First published
23 Dec 2022

Nanoscale, 2023,15, 2292-2304

Enhancing UV photodetection performance of an individual ZnO microwire p–n homojunction via interfacial engineering

K. Tang, M. Jiang, B. Yang, T. Xu, Z. Liu, P. Wan, C. Kan and D. Shi, Nanoscale, 2023, 15, 2292 DOI: 10.1039/D2NR06431F

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