Issue 16, 2016

Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: environment stability and activation by simple vacuum oven desiccation

Abstract

Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is an emerging matrix-free, highly sensitive MS analysis method. An important challenge in using nanoscale silicon SALDI-MS analysis is the aging and stability of silicon after storage in various environments. No proper nanoscale silicon SALDI-MS activation procedure has been reported to solve this issue. This study investigated the sensitivity, wettability, and surface oxidation behavior of nanoscale silicon surface SALDI-MS in a room, an inert gas atmosphere, and a vacuum environment. A simple vacuum oven desiccation was proposed to activate the SALDI-MS surface, and the limit of detection was further enhanced 1000 times to a 500 attomole level using this approach. The long-term stability and desorption/ionization mechanism were also investigated.

Graphical abstract: Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: environment stability and activation by simple vacuum oven desiccation

Article information

Article type
Paper
Submitted
19 Mar 2016
Accepted
10 Jun 2016
First published
13 Jun 2016

Analyst, 2016,141, 4973-4981

Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: environment stability and activation by simple vacuum oven desiccation

C. Tsao, Y. Lin, P. Chen, Y. Yang and S. H. Tan, Analyst, 2016, 141, 4973 DOI: 10.1039/C6AN00659K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements