Issue 18, 2015

A graphene/GaAs near-infrared photodetector enabled by interfacial passivation with fast response and high sensitivity

Abstract

We report a simple AlOx passivation approach to optimize the device performance of a bilayer graphene/gallium arsenide (BLG/GaAs) Schottky junction based near infrared photodetector (NIRPD). The as-fabricated NIRPD is highly sensitive to NIR illumination at zero bias voltage, with a detectivity of 2.88 × 1011, which is much higher than that without passivation (7.3 × 109 cm Hz1/2 W−1). The corresponding responsivity is 5 mA W−1. Additionally, the surface passivation can substantially increase both the response rate (rise/fall time τr/τf from 32/48 μs to 320/380 ns), and lift time. It is expected that such a self-driven NIRPD with fast response and high detectivity will have great potential in the future optoelectronic devices.

Graphical abstract: A graphene/GaAs near-infrared photodetector enabled by interfacial passivation with fast response and high sensitivity

Article information

Article type
Paper
Submitted
14 Feb 2015
Accepted
30 Mar 2015
First published
31 Mar 2015

J. Mater. Chem. C, 2015,3, 4723-4728

A graphene/GaAs near-infrared photodetector enabled by interfacial passivation with fast response and high sensitivity

L. Luo, H. Hu, X. Wang, R. Lu, Y. Zou, Y. Yu and F. Liang, J. Mater. Chem. C, 2015, 3, 4723 DOI: 10.1039/C5TC00449G

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