Issue 35, 2014

Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker

Abstract

Sulfur-based metal chalcogenide films have been widely used for high-performance optoelectronic devices due to their attractive optical and electrical properties. Although typical approaches to the chemical deposition of chalcogenide films have some advantages such as large-area coverage and high thickness controllability, these processes require highly toxic and expensive hydrogenated materials. Here, we demonstrate an enhanced sulfur reaction with an environmentally safe and cost-competitive method using a thermal sulfur cracker cell. The elevated cracking-zone temperature enhanced the reactivity of sulfur by cracking evaporated sulfur molecules into smaller molecules, and resulted in the formation of a high-quality ZnS phase maintaining a low substrate temperature. The fabricated ultra-thin ZnS film played an excellent role as a buffer layer of the Cu(In,Ga)Se2 thin-film solar cell, as the film showed high photovoltaic performances.

Graphical abstract: Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker

Supplementary files

Article information

Article type
Paper
Submitted
19 May 2014
Accepted
03 Jul 2014
First published
04 Jul 2014

J. Mater. Chem. A, 2014,2, 14593-14599

Author version available

Non-toxically enhanced sulfur reaction for formation of chalcogenide thin films using a thermal cracker

D. Cho, W. Lee, S. Park, J. Wi, W. S. Han, J. Kim, M. Cho, D. Kim and Y. Chung, J. Mater. Chem. A, 2014, 2, 14593 DOI: 10.1039/C4TA02507E

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