A high work function anode interfacial layer via mild temperature thermal decomposition of a C60F36 thin film on ITO†
Abstract
A high work function anode interfacial layer has been developed via a mild temperature
* Corresponding authors
a
Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543
E-mail:
phycw@nus.edu.sg
b Department of Physics, National University of Singapore, 3 Science Drive 2, Singapore 117542
c Institute of Material Research & Engineering, 3 Research Link, Singapore
A high work function anode interfacial layer has been developed via a mild temperature
H. Y. Mao, R. Wang, J. Q. Zhong, S. Zhong, J. D. Lin, X. Z. Wang, Z. K. Chen and W. Chen, J. Mater. Chem. C, 2013, 1, 1491 DOI: 10.1039/C2TC00110A
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