Issue 76, 2013
From the journal:

Chemical Communications

Design of D–π–A type photoacid generators for high efficiency excitation at 405 nm and 800 nm†

Ming Jin,*a   Haoran Xu,a   Hong Hong,a   Jean-Pierre Malval,*b   Yuan Zhang,c   Aimin Ren,d   Decheng Wana  and  Hongting Pua  

* Corresponding authors

a School of Materials Science and Engineering, Tongji University, Shanghai, P. R. China
E-mail: mingjin@tongji.edu.cn
Fax: +86 21 69580143
Tel: +86 21 69580143

b Instiute de Sciences des Matériaux de Mulhouse, LRC CNRS 7228, Université de Haute Alsace, ENSCMu, Mulhouse, France
E-mail: jean-pierre.malval@uha.fr

c College of Chemistry, Beijing Normal University, Beijing 100875, China

d College of Chemistry, Jilin University, Changchun, China

Abstract

New sulfonium salts with diphenylamino asymmetrically substituted stilbene as a D–π–A conjugated system have been synthesized. The resulting photoacid generators exhibit a highly efficient acid photogeneration process by either one-photon 405 nm or two-photon 800 nm excitation.

Graphical abstract: Design of D–π–A type photoacid generators for high efficiency excitation at 405 nm and 800 nm

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Article information

DOI
https://doi.org/10.1039/C3CC43018A
Article type
Communication
Submitted
23 Apr 2013
Accepted
25 Jul 2013
First published
26 Jul 2013

Chem. Commun., 2013,49, 8480-8482

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Design of D–π–A type photoacid generators for high efficiency excitation at 405 nm and 800 nm

M. Jin, H. Xu, H. Hong, J. Malval, Y. Zhang, A. Ren, D. Wan and H. Pu, Chem. Commun., 2013, 49, 8480 DOI: 10.1039/C3CC43018A

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