Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers†
Abstract
We demonstrate a very efficient route for electroless deposition of Pd
Maintenance work is planned from 22:00 BST on Monday 16th September 2024 to 22:00 BST on Tuesday 17th September 2024.
During this time the performance of our website may be affected - searches may run slowly, some pages may be temporarily unavailable, and you may be unable to access content. If this happens, please try refreshing your web browser or try waiting two to three minutes before trying again.
We apologise for any inconvenience this might cause and thank you for your patience.
* Corresponding authors
a
Max-Planck-Institute für Eisenforschung GmbH, D-40237 Düsseldorf, Germany
E-mail:
m.rohwerder@mpie.de
b Physical Chemistry I, Ruhr-University Bochum, D-44780 Bochum, Germany
We demonstrate a very efficient route for electroless deposition of Pd
M. I. Muglali, A. Bashir, A. Birkner and M. Rohwerder, J. Mater. Chem., 2012, 22, 14337 DOI: 10.1039/C2JM32111D
To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.
If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.
If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.
Read more about how to correctly acknowledge RSC content.
Fetching data from CrossRef.
This may take some time to load.
Loading related content