Issue 42, 2011
From the journal:

Journal of Materials Chemistry

Direct patterning of quantum dot nanostructuresviaelectron beam lithography†

Vikas Nandwana,a   Chandramouleeswaran Subramani,a   Yi-Cheun Yeh,a   Boqian Yang,a   Stefan Dickert,b   Michael D. Barnes,ab   Mark T. Tuominenb  and  Vincent M. Rotello*a  

* Corresponding authors

a Department of Chemistry, University of Massachusetts Amherst, 710 North Pleasant Street, Amherst, MA, USA
E-mail: rotello@chem.umass.edu
Fax: +1 413-5452058

b Department of Physics, University of Massachusetts Amherst, Amherst, MA, USA

Abstract

Patterned quantum dot (QD) nanostructures were prepared by direct electron beam lithography on QD films. Time resolved photoluminescence measurements show that the optical properties of these QDs were retained after cross-linking.

Graphical abstract: Direct patterning of quantum dot nanostructuresviaelectron beam lithography

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Article information

DOI
https://doi.org/10.1039/C1JM11782C
Article type
Communication
Submitted
22 Apr 2011
Accepted
08 Jul 2011
First published
25 Jul 2011

J. Mater. Chem., 2011,21, 16859-16862

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Direct patterning of quantum dot nanostructuresviaelectron beam lithography

V. Nandwana, C. Subramani, Y. Yeh, B. Yang, S. Dickert, M. D. Barnes, M. T. Tuominen and V. M. Rotello, J. Mater. Chem., 2011, 21, 16859 DOI: 10.1039/C1JM11782C

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