Issue 25, 2010

High refractive index and high transparency HfO2 nanocomposites for next generation lithography

Abstract

HfO2 nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning.

Graphical abstract: High refractive index and high transparency HfO2 nanocomposites for next generation lithography

Supplementary files

Article information

Article type
Communication
Submitted
12 Mar 2010
Accepted
27 Apr 2010
First published
26 May 2010

J. Mater. Chem., 2010,20, 5186-5189

High refractive index and high transparency HfO2 nanocomposites for next generation lithography

W. J. Bae, M. Trikeriotis, J. Sha, E. L. Schwartz, R. Rodriguez, P. Zimmerman, E. P. Giannelis and C. K. Ober, J. Mater. Chem., 2010, 20, 5186 DOI: 10.1039/C0JM00679C

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