The concept of plasma cleaning in glow discharge spectrometry
Abstract
A plasma cleaning procedure to improve elemental depth profiling of shallow layered materials by glow discharge
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* Corresponding authors
a
Corrosion and Protection Centre, School of Materials, The University of Manchester, Manchester, UK
E-mail:
igor.molchan@manchester.ac.uk
Fax: +44 (0)161 3064865
Tel: +44 (0)161 3064828
b HORIBA Jobin Yvon, Longjumeau, France
c Department of Physical and Analytical Chemistry, Faculty of Chemistry, University of Oviedo, Oviedo, Spain
d Department of Physics, Faculty of Science, University of Oviedo, Oviedo, Spain
e Laplace, UMR 5213, Université Paul Sabatier, Toulouse, France
f DPHE, ERT 2000, Université J.F Champollion, Albi, France
g National Institute of Lasers, Plasma and Radiation Physics, Bucharest, Magurele, Romania
h Laboratoire de Physique des Gaz et des Plasmas, UMR CNRS-UPS 8578, Université Paris-Sud, Orsay, France
i EMPA, Swiss Federal Laboratories for Materials Testing and Research, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstr. 39, Thun, Switzerland
A plasma cleaning procedure to improve elemental depth profiling of shallow layered materials by glow discharge
I. S. Molchan, G. E. Thompson, P. Skeldon, N. Trigoulet, P. Chapon, A. Tempez, J. Malherbe, L. Lobo Revilla, N. Bordel, Ph. Belenguer, T. Nelis, A. Zahri, L. Therese, Ph. Guillot, M. Ganciu, J. Michler and M. Hohl, J. Anal. At. Spectrom., 2009, 24, 734 DOI: 10.1039/B818343K
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